Title
Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS
Abstract
Supercritical chemical fluid deposition (SCFD) has been shown to have remarkable advantages for deposition inside nanostructured templates however so far the technique has mostly been used to deposit metals. In this paper we present the SCFD of optoelectronic grade CdS. The quality of this material is demonstrated by a range of techniques including reflectivity (A) and photoluminescence spectroscopy (B and C). At 4 K the bandedge luminescence has a full-width-at-half-maximum linewidth of 30 meV comparable with that of single crystal CdS.
Disciplines
Chemistry | Materials Chemistry
Recommended Citation
Yang, J., Hyde, J.R., Wilson, J.W., Mallik, K., Sazio, P., O’Brien, P., Malik, M.A., Afzaall, M., Nguyen, C.Q., George, M.W., Howdle, S.M., &Smith, D.C. (2009) ‘Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS’. Advanced Materials, 21(41), 4115-4119.
Digital Commons Citation
Yang, Jixin; Hyde, Jason R.; Wilson, James W.; Mallik, Kanad; Sazio, Pier; O'Brien, Paul; Malik, Mohamed A.; Afzaal, Mohammad; Nguyen, Chinh Q.; George, Michael W.; Howdle, Steven M.; and Smith, David C., "Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS" (2009). Advanced Materials Research Laboratory. Paper 11.
http://epubs.glyndwr.ac.uk/amrl/11
Comments
Metadata only available from this repository. © 2009 Wiley Publishing. This article was originally published in the Journal of Advanced Materials in 2009, by Wiley. The definitive version is available at http://www3.interscience.wiley.com